Description
ENI GHW-12Z产品详情
产品概述
ENI GHW-12Z是一款高频射频发生器，主要用于产生高频射频能量，广泛应用于等离子体处理、半导体制造、材料科学等领域。它以其高功率密度、稳定性好、易于操作等特点而受到广泛应用。
主要特点
高功率密度：GHW-12Z能够提供高达1250瓦的射频输出功率，满足各种应用需求。
高频稳定性：频率稳定性高，确保等离子体过程的重复性和可靠性。
灵活的控制方式：提供多种控制接口，方便用户进行远程控制和监测。
可靠性高：采用工业级设计，具有较高的可靠性和耐用性。
应用广泛：广泛应用于等离子体刻蚀、薄膜沉积、表面处理等领域。
技术参数（典型值）
输出功率：1250W
频率：13.56MHz
输出阻抗：50Ω
调制方式：AM/FM
冷却方式：风冷
应用领域
半导体制造：等离子体刻蚀、薄膜沉积、清洗等工艺。
平板显示：TFT-LCD、OLED等显示器的制造。
太阳能电池：太阳能电池的表面处理。
生物医学：等离子体灭菌、细胞培养等。
材料科学：材料的表面改性、薄膜制备等。
ENI GHW-12Z Product Details
Product Overview
ENI GHW-12Z isa high-frequency RF generator,mainly used to generate high-frequency RF energy,widely used in plasma processing,semiconductor manufacturing,materials science and other fields.It is widely used for its high power density,good stability and easy operation.
Main Features
High power density:GHW-12Z can provide up to 1250 watts of RF output power to meet various application requirements.
High frequency stability:High frequency stability ensures the repeatability and reliability of the plasma process.
Flexible control mode:Provides a variety of control interfaces for users to facilitate remote control and monitoring.
High reliability:Adopts industrial-grade design with high reliability and durability.
Wide application:Widely used in plasma etching,thin film deposition,surface treatment and other fields.
Technical parameters(typical values)
Output power:1250W
Frequency:13.56MHz
Output impedance:50Ω
Modulation mode:AM/FM
Cooling mode:air cooling
Application areas
Semiconductor manufacturing:plasma etching,thin film deposition,cleaning and other processes.
Flat panel display:manufacturing of TFT-LCD,OLED and other displays.
Solar cells:surface treatment of solar cells.
Biomedicine:plasma sterilization,cell culture,etc.
Material science:surface modification of materials,thin film preparation,etc.
